Active Archive International AiR at North Lands Creative

Active Archives AIR at North Lands Creative

Archives and research-based work will be a dominant thread throughout our 2020 artist residencies signalling the launch of an in-depth enquiry into the layered histories of North Lands Creative. The Active Archive Residencies is an extensive research initiative that will delve into North Lands Creative 24 year history, to look at imagined futures and proposals for transformation contained within its archives. Over the residency period, the residency artist will have access to documents and collection pieces contained within our archive as well as privately collected materials. From this will emerge the many entangled histories of the UK’s premier glass organisation. The residency artist will be asked to show a new body of work created during their residency to be presented within our 25th anniversary year programme in 2021.

North Lands Creative is seeking proposals from individual artists who would like to develop their practice and respond to our archive and collection through a one month-long solo residency at our campus in Lybster. The opportunity includes: an artist fee, materials budget, travel expenses, free accommodation and complementary studio access at our Alastair Pilkington Studio. The successful residents will also receive 1-2-1 support from our team in producing, developing, and discussing their work and critical practice. Proposals from artists who would like to work collaboratively with another artist will be accepted, although the budget will then be shared between collaborators.

  • 26th October – 20th November 2020
  • Open to UK & International Artists
  • Artist Fee £500
  • Materials Budget £850
  • Travel £800
  • Free Accommodation
  • Complimentary Studio Access

For Further info visit : https://northlandscreative.co.uk/active-archive-international-air/ or contact info@northlandscreative.co.uk REF: ACTIVE ARCHIVE AiR

Application deadline is Friday 3rd April 2020

Please download and complete an Application Form below: